Search results for "Algan gan"

showing 2 items of 2 documents

Multi-pulse characterization of trapping/detrapping mechanisms in AlGaN/GaN high electromobility transistors

2019

GaN high-electro mobility transistors (HEMTs) are among the most promising candidates for use in high-power, high-frequency, and high-temperature electronics owing to their high electrical breakdown threshold and their high saturation electron velocity. The applications of these AlGaN/GaN HEMTs in power converters are limited by the surface trapping effects of drain-current collapse. Charge-trapping mechanisms affect the dynamic performance of all GaN HEMTs used in power switching applications. This study analyzes the dynamic resistance of GaN HEMTs and finds that the effects of dynamic resistance can be suppressed by controlling switching conditions and on-off cycles.

010302 applied physicsMaterials sciencebusiness.industryTransistorElectrical breakdownAlgan gan02 engineering and technologyTrappingConverters021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesElectronic Optical and Magnetic Materialslaw.inventionDynamic resistancelaw0103 physical sciencesMaterials ChemistryOptoelectronicsElectronicsElectrical and Electronic Engineering0210 nano-technologybusinessSaturation (magnetic)Semiconductor Science and Technology
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Modification of the sheet resistance under Ti/Al/Ni/Au Ohmic contacts on AlGaN/GaN heterostructures

2018

This paper reports on the modification of the sheet resistance under Ti/Al/Ni/Au Ohmic contacts on AlGaN/GaN heterostructures, studied by means of Transmission Line Model (TLM) structures, morphological and structural analyses, as well as computer simulations. In particular, the contacts exhibited an Ohmic behaviour after annealing at 800 degrees C, with a specific contact resistance rho(c) = (2.4 +/- 0.2) x 10(-5) Omega cm(2), which was associated to morphological and structural changes of both the metal layer and the interface. Interestingly, TLM analyses gave a value of the sheet resistance under the contact (R-SK = 26.1 +/- 5.0 Omega/rectangle) significantly lower than that measured out…

Materials scienceAnnealing (metallurgy)Algan gan02 engineering and technology01 natural sciencesMetal0103 physical sciencesAlGaN/GaN heterostructuresGeneral Materials ScienceComposite materialOhmic contactSheet resistanceOhmic contacts010302 applied physicsbusiness.industryMechanical EngineeringContact resistanceTransmission Line ModelHeterojunction021001 nanoscience & nanotechnologyCondensed Matter PhysicsSemiconductorMechanics of Materialsvisual_artvisual_art.visual_art_mediumTi/Al/Ni/Au0210 nano-technologybusiness
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